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Growth of Crystalline Silicon Carbide | |
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Recent Progress in Epitaxial Growth of SiC | |
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Si[subscript 1-y]C[subscript y] Alloys - Extending Si-Based Heterostructure Engineering | |
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Investigation of the Growth of 3C-SiC and 6H-SiC Films on Low-Tilt-Angle Vicinal (0001) 6H-SiC Wafers | |
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Low Temperature Homoepitaxial Growth of 6H-SiC by VPE Method | |
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Heteroepitaxial Growth of 3C-SiC by LPCVD with Alternate Gas Supply | |
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Mechanisms in the Low Pressure Growth of SiC-on-Si by RTCVD | |
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Effects of CH[subscript 3]Cl Gas on Heteroepitaxial Growth of [Beta]-SiC on Si(111) by Chemical Vapor Deposition | |
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Growth Simulation of SiC Polytypes and Application to DPB-Free 3C-SiC on Alpha-SiC Substrates | |
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Epitaxial Growth of Cubic SiC Using Various Alkyl-Silicon Compounds by Chemical Vapor Deposition | |
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Growth and Characterization of [Beta]-SiC Films Grown on Si by Gas-Source Molecular Beam Epitaxy | |
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Atomic Layer Control of [Beta]-SiC(001) Surface | |
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Growth and Characterization of 6H-SiC Bulk Crystals by the Sublimation Method | |
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Liquid Phase Epitaxy of SiC-AIN Soled Solutions | |
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Comparison of Dilutely Doped p-Type 6H-SiC from a Variety of Sources | |
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Growth of Cubic Silicon Carbide on Silicon Using the C[subscript 2]HCl[subscript 3]-SiH[subscript 4]-H[subscript 2] System | |
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AC Plasma-Assisted Chemical Vapor Deposition of Cubic Silicon Carbide on Silicon Substrate | |
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Characterization of Crystalline Silicon Carbide | |
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Hall Effect and Infrared Absorption Measurements on Nitrogen Donors in 6H-SiC | |
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Nitrogen Impurities in 3C-SiC Epilayers | |
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Electron Nuclear Double Resonance Investigations of Nitrogen Donors in 6H and 4H-SiC | |
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Recrystallization and Electrical Properties of High-Temperature Implanted (N,Al) 6H-SiC Layers | |
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EPR in the 2-mm Range and Optical Absorption of the Native Defect in 4H-SiC Epilayers | |
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The Structure of the D-Center in Silicon Carbide - A Study with Electron Nuclear Double Resonance | |
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Oxidation Studies for 6H-Si6 | |
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Electronic Band Structures of SiC Calculated from a Hybrid Pseudopotential and Tight-Binding Model | |
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Metallization Studies on Epitaxial 6H-SiC | |
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TEM Study of [Beta]-SiC Films Grown on (111) Silicon Substrates | |
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Thermal Oxidation of Single-Crystal Silicon Carbide: Kinetic, Electrical, and Chemical Studies | |
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Determination of Stacking-Fault Abundances and Distributions in SiC Using XRPD and HRTEM | |
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Structural Defects in Epitaxial Layers SiC-3C/Si Grown by CVD | |
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Observation of Linear Electro-Optic Effect in Cubic Silicon Carbide | |
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Optically Induced Near-IR Absorption Lines in 6H-SiC | |
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Interference Fringes in the Infrared Reflectance of 6H-SiC Films on 6H-SiC Substrates | |
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Low Temperature Photoluminescence of SiC: A Method for Material Characterization and the Influence of an Uniaxial Stress on the Spectra | |
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Growth and Characterization of Polycrystalline, Microcrystalline, and Amorphous Silicon Carbide | |
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Novel Feedstocks for a-SiC:H Films | |
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Studies of 1,3-Disilacyclobutanes as Single-Source CVD Precursors to Silicon Carbide | |
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Frequency Dependence of Conductivity of Hydrogenated Amorphous SiC Films Prepared by PCVD | |
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Formation of SiC for Microelectronic Applications by C Implantation into Doped a-Si | |
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Polycrystalline SiC Films Prepared by a Plasma Assisted Method at Temperatures Lower than 1000[degree]C | |
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Si[subscript x]C[subscript 1-x] Alloys Deposited on Silicon Using a Low-Cost, Hot-Wall, LPCVD Reactor | |
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Low Temperature PECVD Growth and Characterization of a-SiC:H Films Deposited from Silacyclobutane and Silane/Methane Precursor Gases | |
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Study of Optimum Condition for Microcrystalline SiC Film Formation by ECR Plasma CVD Method | |
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Applications | |
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Applications for 6H-Silicon Carbide Devices | |
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HBTs Using a-SiC and [mu]c-Si | |
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Impact of SiC on Power Devices | |
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SiC[subscript x]:F Hetero-Emitter and Epitaxial-Base Bipolar Transistors | |
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A New Application of a-SiC Films for Realizing High Current Gain Si Heterojunction Bipolar Transistors | |
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The Development of ECR-CVD SiC Coatings for X-Ray Mask Membranes | |
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Pattern Etching of Crystalline SiC by KrF Excimer Laser | |
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Electrical Characterization of PiN Diode Structures in 6H-SiC | |
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High-Temperature Rectifiers, UV Photodiodes, and Blue LEDs in 6H-SiC | |
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Dependence of the Au-SiC(6H) Schottky Barriers Height on the SiC Surface Treatment | |
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Photoelectrochemical Etching and Dopant Selective Etch-Stops in SiC | |
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Fabrication and Electrical Properties of [Beta]-SiC/Si and Poly-SiC/Si Solar Cells | |
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Simulations of Ge and C Implantations to Form Si[[subscript 1-x]Ge[subscript x] BJT | |
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The Light Emitting Diodes on the Basis of Fast Electron Irradiated Silicon Carbide | |
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Graded-Gap and Quantum-Well Injection a-SiC:H p-i-n Light-Emitting Diodes | |
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High-Temperature and High-Voltage Diamond Devices | |
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Gamma-Ray Irradiation Effects on Cubic Silicon Carbide Metal-Oxide-Semiconductor Structure | |
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Formation of SiGe/Si Heterostructures by Low-Temperature Germanium Ion Implantation | |
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Characterization of Ge and C Implanted Si Diodes | |
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Selective Growth of SiC and Application to Heterojunction Devices | |
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Electrical Characterization of Epitaxial Titanium Contacts to Alpha (6H) Silicone Carbide | |
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Effect of H[subscript 2]2 Additive on Reactive Ion Etching of [Beta]-SiC in CHF[subscript 3]/O[subscript 2] Plasma | |
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Index of Contributors | |