Thin Film Processes

Name: Thin Film Processes
Price: 111.17 USD
Availability: InStock
ISBN: 9780127282510

ISBN-10: 0127282513

ISBN-13: 9780127282510

Edition: 1991

Authors: John L. Vossen, Werner Kern

List price: $185.00

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Description:

This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques.

Book details

List price: $185.00
Copyright year: 1991
Publisher: Elsevier Science & Technology Books
Publication date: 4/28/1991
Binding: Hardcover
Pages: 888
Size: 6.50" wide x 9.25" long x 1.75" tall
Weight: 2.992
Language: English



Introduction


Glow Discharge Plasma and Sources for Etching and Deposition


Evaporation Processes


Molecular Beam Epitaxy


Sputter Deposition Processes


The Cathodic Arc Plasma Deposition of Thin Films


Thermal Chemical Vapor Deposition


Metal-Organic Chemical Vapor Deposition


Photochemical Vapor Deposition


Sol-Gel Coatings


Plasma-Enhanced Chemical Vapor Deposition


Formation of Inorganic Films by Remote Plasma-Enhanced Chemical-Vapor Deposition


Selected Area Processing


Plasma-Assisted Etching


Ion Beam Etching


Laser-Driven Etching