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Manufacturable Process/Tool for High-k/Metal Gate:

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ISBN-10: 3836481561

ISBN-13: 9783836481564

Edition: 2008

Authors: Aarthi Venkateshan, Rajendra Singh

List price: $111.00
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Off state leakage current related power dominates the CMOS heat dissipation problem of state of the art silicon integrated circuits. In this study, this issue has been addressed in terms of a low-cost single wafer processing (SWP) technique using a single tool for the fabrication of high- dielectric gate stacks for sub-45 nm CMOS. A system for monolayer photoassisted deposition was modified to deposit high-quality HfO2 films with in-situ clean, in-situ oxide film deposition, and in-situ anneal capability. The system was automated with Labview 8.2 for gas/precursor delivery, substrate temperature and UV lamp. The gold-hafnium oxide-aluminum (Au-HfO2-Al) stacks processed in this system had…    
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Book details

List price: $111.00
Copyright year: 2008
Publisher: Lightning Source Inc
Binding: Paperback
Pages: 204
Size: 5.75" wide x 8.75" long x 0.25" tall
Weight: 0.594
Language: English