Materials Chemistry

Bradley Fahlman obtained his PhD at Rice University (Houston, Texas) in 2000 and was awarded his BSc. (High Hons.) at the University of Regina (Canada) in 1996. At present he is Associate Professor of Chemistry at Michigan University. His research interests involve amongst others the synthesis of novel hafnium thin-film precursors, use of these precursors for oxide/nitride/oxynitride thing film growth using chemical vapor deposition (CVD) and atomic layer deposition (ALD), development and electrochemical testing of novel nanomaterials ofr Li ion battery anode applications and mechanistic investigation of low-temperature carbon nanotube/nanofibre growth. Brad is head of the Fahlman research…  More group, whose overall objective is to design new and improved routes to interesting and industrially useful nanostructural materials and thin films. The following projects are of current ongoing interest to the group, finding applications for homeland security, as well as advanced components such as fuel cells, sensors, microelectronic devices, and future molecular electronic nanodevices: 1. Design of materials for low-temperature degradation of chemical warfare agents and pesticides. 2. Supercritical fluid facilitated growth of thin films and novel nanostructural materials. 3. Chemical vapor deposition/characterization of Group 13 nitride and oxynitride thin films, including the development of novel single-source, liquid precursors. 4. Nanotube-template chemical vapor deposition of novel nanostructures. Bradley Fahlman received a 2008 Textbook Excellence Award from the Text and Academic Authors Association (TAA) for the first edition of his book Materials Chemistry.  Less