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Principles of Chemical Vapor Deposition

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ISBN-10: 1402012489

ISBN-13: 9781402012488

Edition: 2003

Authors: Daniel M. Dobkin, Michael K. Zuraw

List price: $219.99
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Do you work with chemical Vapor deposition processes or reactors? Have you ever wondered what goes on inside the chamber or how the deposition processes work? If the answer to this is yes, then Principles of Chemical Vapor Deposition is for you! Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit…    
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Book details

List price: $219.99
Copyright year: 2003
Publisher: Springer Netherlands
Publication date: 4/30/2003
Binding: Hardcover
Pages: 273
Size: 6.10" wide x 9.25" long x 0.75" tall
Weight: 2.838
Language: English

What's behind the facade?
Generic reactors and process considerations
Tube and showerhead reactor examples
Reactors without transport
What goes in must go somewhere: Measuring gases
Review: Kinetic theory
The zero-dimensional reactor
Zero-dimensional tube and showerhead examples
Mass transport
Introduction to transport
Convection and diffusion
Diffusion: Physics and math
Fluid flow and convective transport
When flows matter: The Knudsen number
Tube and showerhead examples
On to photons
Heat transport
What is heat (energy) transport?
Heat conduction and diffusion
Convective heat transfer made (very) simple
Natural convection
Radiative heat transfer
Temperature measurement
Tube and showerhead examples
Chemistry for CVD
What does the C stand for anyway?
Volatility, the V in CVD
Equilibrium: Where things are going
Kinetics: The slowest step wins
Real precursors for real films
Tube reactor example
A few final remarks
Gas discharge plasmas for CVD
Plasma discharges: An instant review
The low-pressure cold-plasma state
Key parameters for capacitive plasma state
Alternative excitation methods
Plasmas for deposition
Plasma damage
Technical details
Ongoing example: Parallel plate reactor
A remark on computational tools
CVD films
Why CVD?
Silicon dioxide
Silicon nitride
Tantalum pentoxide
Metal deposition by CVD
Concluding remarks
CVD reactors
CVD reactor configurations
Tube reactors
Showerhead reactors
High density plasma reactors
Injector-based atmospheric pressure reactors
Reactor conclusions