Principles of Chemical Vapor Deposition

Name: Principles of Chemical Vapor Deposition
Price: 246.07 USD
Availability: InStock
ISBN: 9781402012488

ISBN-10: 1402012489

ISBN-13: 9781402012488

Edition: 2003

Authors: Daniel M. Dobkin, Michael K. Zuraw

List price: $249.99

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Description:

Do you work with chemical Vapor deposition processes or reactors? Have you ever wondered what goes on inside the chamber or how the deposition processes work? If the answer to this is yes, then Principles of Chemical Vapor Deposition is for you! Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit…

Book details

List price: $249.99
Copyright year: 2003
Publisher: Springer Netherlands
Publication date: 4/30/2003
Binding: Hardcover
Pages: 273
Size: 6.10" wide x 9.25" long x 0.75" tall
Weight: 2.838
Language: English



Acknowledgements


Preface



Introduction



What's behind the facade?



Generic reactors and process considerations



Tube and showerhead reactor examples



Reactors without transport



What goes in must go somewhere: Measuring gases



Review: Kinetic theory



The zero-dimensional reactor



Zero-dimensional tube and showerhead examples



Mass transport



Introduction to transport



Convection and diffusion



Diffusion: Physics and math



Fluid flow and convective transport



When flows matter: The Knudsen number



Tube and showerhead examples



On to photons



Heat transport



What is heat (energy) transport?



Heat conduction and diffusion



Convective heat transfer made (very) simple



Natural convection



Radiative heat transfer



Temperature measurement



Tube and showerhead examples



Chemistry for CVD



What does the C stand for anyway?



Volatility, the V in CVD



Equilibrium: Where things are going



Kinetics: The slowest step wins



Real precursors for real films



Tube reactor example



A few final remarks



Gas discharge plasmas for CVD



Plasma discharges: An instant review



The low-pressure cold-plasma state



Key parameters for capacitive plasma state



Alternative excitation methods



Plasmas for deposition



Plasma damage



Technical details



Ongoing example: Parallel plate reactor



A remark on computational tools



CVD films



Why CVD?



Silicon dioxide



Silicon nitride



Tantalum pentoxide



Metal deposition by CVD



Concluding remarks



CVD reactors



CVD reactor configurations



Tube reactors



Showerhead reactors



High density plasma reactors



Injector-based atmospheric pressure reactors



Reactor conclusions


Index