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Soft X-Rays and Extreme Ultraviolet Radiation Principles and Applications

ISBN-10: 052102997X

ISBN-13: 9780521029971

Edition: 2006

Authors: David Attwood

List price: $77.00
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Description:

This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
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Book details

List price: $77.00
Copyright year: 2006
Publisher: Cambridge University Press
Publication date: 2/22/2007
Binding: Paperback
Pages: 504
Size: 8.00" wide x 10.00" long x 1.00" tall
Weight: 1.892
Language: English

Preface
Acknowledgements
Introduction
Radiation and scattering at EUV and soft x-ray wavelengths
Wave propagation and refractive index at EUV and soft x-ray wavelengths
Multilayer interference coatings
Synchrotron radiation
Physics of hot dense plasmas
Extreme ultraviolet and soft x-ray lasers
Coherence at short wavelengths
Soft x-ray microscopy with diffractive optics
Extreme ultraviolet and x-ray lithography
Appendices
Index