Photomask Fabrication Technology

Name: Photomask Fabrication Technology
Price: 160.78 USD
Availability: InStock
ISBN: 9780071445634

ISBN-10: 0071445633

ISBN-13: 9780071445634

Edition: 2006

Authors: Benjamin G. Eynon, Banqiu Wu

List price: $173.00

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Description:

Photomasks have become a necessity in modern semiconductor manufacturing - a defect-free optical process that allows the efficient fabrication of very small microelectronics. This is the first reference book on the topic.

Book details

List price: $173.00
Copyright year: 2006
Publisher: McGraw-Hill Education
Publication date: 8/11/2005
Binding: Hardcover
Pages: 500
Size: 6.00" wide x 9.10" long x 1.78" tall
Weight: 2.024
Language: English



Contributors


Preface



Introduction




Data Preparation




Pattern Generation




Photomask Pattern Transfer




Photomask Metrology




Process Back End and Defectivity Control




Resolution Enhancement Techniques




NGL Mask Technology Introduction



Index