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Photomask Fabrication Technology

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ISBN-10: 0071445633

ISBN-13: 9780071445634

Edition: 2006

Authors: Benjamin G. Eynon, Banqiu Wu

List price: $157.00
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Photomasks have become a necessity in modern semiconductor manufacturing - a defect-free optical process that allows the efficient fabrication of very small microelectronics. This is the first reference book on the topic.
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Book details

List price: $157.00
Copyright year: 2006
Publisher: McGraw-Hill Education
Publication date: 8/11/2005
Binding: Hardcover
Pages: 500
Size: 6.00" wide x 9.10" long x 1.78" tall
Weight: 2.024
Language: English

Data Preparation
Pattern Generation
Photomask Pattern Transfer
Photomask Metrology
Process Back End and Defectivity Control
Resolution Enhancement Techniques
NGL Mask Technology Introduction