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| Preface | |
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| Some Background in the Physics of Solids | |
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| States of Matter | |
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| Atomic Structures | |
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| The Crystalline Solid | |
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| Electronic Energy Bands in Solids | |
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| Extrinsic Semiconductors (Doping) | |
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| The Fermi-Dirac Distribution | |
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| Device Background | |
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| Materials Selection | |
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| The pn Junction | |
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| The Bipolar Transistor | |
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| The Unipolar Transistor | |
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| The Unit Operations of Semiconductor Device Fabrication | |
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| A Process Sequence for Fabrication of a Bipolar Transistor | |
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| Process Modeling | |
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| A Process Model | |
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| The Conservation Equations | |
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| Cleanliness and Purity in the Process Environment: Filtration of Particulates | |
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| Particulate Control | |
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| Clean Room Dynamics | |
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| Filtration of Airborne Particles | |
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| Pressure Drop across Fibrous Filters | |
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| Porous Membrane Ultrafiltration | |
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| Pressure Drop across Microporous Filters | |
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| Use of Pressure Drop Measurements to Correct Filtration Models | |
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| Particle Deposition and Removal | |
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| Deposition of Particles on Surfaces | |
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| The Physics of Adhesion of Particles to Surfaces | |
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| Mechanism of Removal of Particles from Surfaces | |
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| Analysis of Some Features of a Wafer Scrubber | |
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| Some Other Aspects of Jet Dynamics | |
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| Production and Maintenance of Purity in Process Chemicals | |
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| Production of Ultrapure Nitrogen | |
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| Maintenance of Chemical Purity through Recovery | |
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| Purification of Silicon Tetrachloride | |
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| Silicon Production | |
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| The Siemens Process | |
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| Czochralski Growth | |
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| Oxidation of Silicon | |
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| Dry Thermal Oxidation of Silicon | |
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| Wet Thermal Oxidation of Silicon | |
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| Mechanisms of Oxide Growth | |
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| Microlithography | |
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| Microstructure Fabrication | |
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| Some Aspects of Organic Resist Materials | |
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| The Kinetics of Development | |
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| Resist Profile Development | |
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| Spin Coating of Resist | |
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| Doping | |
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| Simple Fickian Diffusion Model of Doping | |
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| Resistivity of Diffused Layers | |
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| Doping Systems | |
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| Dopant Redistribution | |
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| Lateral Diffusion | |
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| Concentration-Dependent Diffusion | |
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| The Mathematics of Nonlinear Diffusion | |
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| Etching | |
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| The Plasma State | |
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| Plasma Etching | |
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| Plasma Reactor Dynamics | |
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| Anisotropy: Ion Etching and Chemical Etching | |
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| Wet Etching | |
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| Anisotropy in Wet Etching | |
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| Chemical Vapor Deposition | |
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| Chemical Thermodynamics | |
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| Chemical Kinetics | |
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| Reactor Design for CVD | |
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| Nonkinetic Aspects of Reactor Design | |
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| Ion Implantation | |
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| Is Ion Implantation Necessary? | |
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| The Ion Implantation System | |
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| The Implant Process | |
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| Metallization | |
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| Conductivity of Metals | |
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| Physical Vapor Deposition | |
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| Index | |